Designed with modularity in mind, the BX3M series provide versatility for a wide variety of materials science and industrial applications. With improved integration with OLYMPUS Stream software, the BX3M provides a seamless workflow for standard microscopy and digital imaging users from observation to report creation.
The illuminator minimizes complicated actions that are usually necessary during microscope operation. A dial at the front of the illuminator enables the user to easily change the observation method. An operator can quickly switch between the most frequently used observation methods in reflected light microscopy, such as from brightfield, to darkfield, to polarized light, in order to readily change between different types of analysis. In addition, simple polarized light observation is adjustable by rotating the analyzer.
An operator can quickly switch between frequently used observation methods.(Polished sample of AlSi)
Using the proper aperture stop and field stop settings provides good image contrast and makes full use of the numerical aperture of the objective. The legend guides the user to the correct setting based on the observation method and objective in use.
The focus scale index on the frame supports quick access to the focal point. Operators can roughly adjust the focal point without viewing the sample through an eyepiece, saving time when inspecting samples that are different heights.
During the initial setup, the illumination intensity can be adjusted to match the specific hardware configuration of the coded illuminator and/or coded nosepiece.
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Conventional Light Intensity |
The image gets too bright or dark when changing magnification or observation method. |
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Light Intensity Manager |
The light intensity is automatically adjusted to produce the optimal image when changing magnification or observation method. |
A system design affects users' work efficiency. Both standalone microscope users and those integrating with OLYMPUS Stream image analysis software benefit from convenient handset controls that clearly display the hardware position. The simple handsets enable the user to focus on their sample and the inspection they need to perform.
Hand switch for motorized nosepiece rotation
Hand switch
Snap shot button
Coded functions integrate the system settings of the BX53M with OLYMPUS Stream image analysis software. The observation method, illumination intensity, and magnification are automatically recorded by the software and stored with the associated images. Since operators can always conduct inspections with the same observation settings, reliable inspection results can be delivered.
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Different operators use different settings. | Retrieve the device settings with OLYMPUS Stream software. | Different operators can use the same settings. |
The BX53M’s MIX observation technology combines traditional illumination methods with darkfield illumination. When the MIX slider is used, its ring of LEDs shine directional darkfield on the sample. This has a similar effect to traditional darkfield, but provides the ability to select a quadrant of the LEDs in order to direct the light from different angles. This combination of directional darkfield and brightfield, fluorescence, or polarization is called MIX illumination, and is especially helpful to highlight defects and differentiate raised surfaces from depressions.
Structure on semiconductor wafer
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The IC pattern is unclear. | The wafer color is invisible. | Both the wafer color and IC pattern are clearly represented. |
Photoresist residue on a semiconductor wafer
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The sample itself is invisible. | The residue is unclear. | Both the IC pattern and residue are clearly represented. |
Condenser
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The surface is reflected. | Several images with directional darkfield from different angles. | By stitching together clear images with no halation, a single crisp image of the sample is created. |
You can now stitch images easily and quickly just by moving the XY knobs on the manual stage; no motorized stage is necessary. OLYMPUS Stream uses pattern recognition to generate a panoramic image giving users a wider field of view than a single frame.
Instant MIA image of a coin
The Extended Focus Imaging (EFI) function within OLYMPUS Stream captures images of samples whose height extends beyond the depth of focus of the objective and stacks them together to create one image that is all in focus. EFI can be executed with either a manual or motorized Z-axis and creates a height map for easy structure visualization. It is also possible to construct an EFI image while offline within Stream Desktop.
Using advanced image processing, high dynamic range (HDR) adjusts for differences in brightness within an image to reduce glare. HDR improves the visual quality of digital images thereby helping to generate professional-looking reports.
Clearly exposed for both of dark and bright parts by HDR
(Sample: fuel injector bulb)
Contrast enhancement by HDR
(Sample: Sliced magnesite)
Various measurement functions are available through OLYMPUS Stream so that the user can easily obtain useful data from the images. For quality control and inspection, measuring features on images are often required. All levels of OLYMPUS Stream licenses include interactive measurement functions such as distances, angles, rectangles, circles, ellipses, and polygons. All measured results are saved with the image files for further documentation.
> Click here for details about OLYMPUS Stream
Object detection and size distribution measurement are among the most important applications in digital imaging. OLYMPUS Stream incorporates a detection engine that utilizes threshold methods to reliably separate objects (e.g., particles, scratches) from the background.
> Click here for details about OLYMPUS Stream
OLYMPUS Stream offers an intuitive, workflow-oriented interface for complex image analysis. At the click of a button, the most complex image analysis tasks can be executed quickly, precisely, and in compliance with most common industrial standards. With a significant reduction in processing time for repeated tasks, materials scientists can concentrate on analysis and research. Modular add-ins for inclusions and intercept charts are easily performed at any time.
> Click here for details about OLYMPUS Stream
When using an external motorized focus drive, an EFI image can be quickly captured and displayed in 3D. The height data acquired can be used for 3D measurements on the profile or from the single view image.
3D surface view (Roughness test sample)
Single view and 3D profile measurement
> Click here for details about OLYMPUS Stream
The new 150 × 100 mm stage provides a longer travel in the X direction than previous models. This, together with the flat-top design, enables large samples or multiple samples to be easily placed on the stage. The stage plate has tapped holes to attach a sample holder. The larger stage provides flexibility to users by enabling them to inspect more samples on one microscope, saving valuable lab space. The stage’s adjustable torque facilitates fine positioning under high magnification with a narrow field of view.
BX53MRF-S
Samples up to 105 mm can be mounted on the stage with the optional modular unit. Due to the improved focusing mechanism, the microscope can accommodate a total weight (sample + stage) of up to 6 kg. This means that larger and heavier samples can be inspected on the BX53M, so fewer microscopes are required in the lab. By strategically positioning a rotatable holder for 6-inch wafers off-center, users can observe the whole wafer surface by just rotating the holder when moving through the 100 mm travel range. The stage's torque adjustment is optimized for ease of use and the comfortable handle grip makes it easy to find the region of interest of the sample.
BXFM
When samples are two large to place on a traditional microscope stage, the core optical components for reflected light microscopy can be configured in a modular configuration. This modular system, the BXFM, can be mounted to a larger stand via a pole or mounted to another instrument of choice using a mounting bracket. This enables users to take advantage of Olympus’ renowned optics even when their samples are unique in size or shape.
The BX53M has an ESD dissipation capability that protects electronic devices from static electricity caused by human or environmental factors.
The optical performance of objective lenses directly impacts the quality of the observation images and analysis results. Olympus UIS2 high-magnification objectives are designed to minimize wavefront aberrations, delivering reliable optical performance.
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Bad wavefront | Good wavefront (UIS2 objective) |
> Click here for details about UIS2 objective lenses
The BX53M utilizes a high-intensity white LED light sources for both reflected and transmitted light. The LED maintains a consistent color temperature regardless of intensity. LEDs provide efficient, long-life illumination that is ideal for inspecting materials science applications.
Color varies with light intensity.
Color is consistent with light intensity and clearer than halogen.
* All images captured using auto exposure
Similar to digital microscopes, automatic calibration is available when using OLYMPUS Stream. Auto-calibration eliminates human variability in the calibration process leading to more reliable measurements. Auto calibration uses an algorithm that automatically calculates the correct calibration from an average of multiple measurement points. This minimizes variance introduced by different operators and maintains consistent accuracy, improving reliability for regular verification.
> Click here for details about OLYMPUS Stream
OLYMPUS Stream software features shading correction to accommodate for shading around the corners of an image. When used with intensity threshold settings, shading correction provides a more precise analysis.
Semiconductor wafer (Binarized image)
Shading correction produces even illumination across the field of view.
> Click here for details about OLYMPUS Stream
There are two types of microscope frames in the BX3M series, one for reflected light only and one for both reflected and transmitted light. Both frames can be configured with manual, coded, or motorized components. The frames are outfitted with ESD capability to protect electronic samples.
IR objectives can be used for semiconductor inspection, measurement, and processing applications where imaging through silicon is required to see the pattern. 5X to 100X infrared (IR) objectives are available with chromatic aberration correction from visible light wavelengths through the near infrared. For highmagnification work, rotating the correction collar of the LCPLNIR series of lenses corrects for aberrations caused by sample thickness. A clear image is obtained with a single objective.
The optics of the BX53M polarized light combination provide geologists with the right tools for high-contrast polarized light imaging. Applications such as mineral identification, investigating the optical characteristics of crystals, and observing solid rock sections benefit from system stability and precise optical alignment.
Measuring range of compensators
| Compensator | Measuring Range | Major Application |
| Thick Berek(U-CTB) |
0-11,000 nm
(20λ) | Measurement of High Retardation Level (R*>3λ), (crystals, macromolecules, fiber, etc.) |
| Berek(U-CBE) |
0-1,640 nm
(3λ) | Measurement of Retardation Level (crystals, macromolecules, living organisms, etc.) |
| SenarmontCompensator(U-CSE) |
0-546 nm
(1λ) | Measurement of Retardation Level (crystals, living organisms, etc.) Enhancement of Image Contrast (living organisms, etc.) |
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Brace-Koehler Compensator
1/10λ (U-CBR1) |
0-55 nm
(1/10λ) |
Measurement of Low Retardation Level (living organisms, etc.)
Enhancement of Image Contrast (living organisms, etc.) |
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Brace-Koehler Compensator
1/30λ (U-CBE2) |
0-20 nm
(1/30λ) |
Measurement of image contrast
(living organisms, etc.) |
| Quartz Wedge(U-CWE2) |
500-2,200 nm
(4λ) | Approximate Measurement of Retardation Level (crystal, macromolecules, etc.) |
*R = retardation level
For more accurate measurement, it is recommended that compensators (except U-CWE2) be used together with the interference filter 45-IF546
Thanks to Olympus’ sophisticated design and manufacturing technology, the UPLFLN-P strainfree objectives reduce internal strain to the minimum. This means a higher EF value, resulting in excellent image contrast.
> Click here for details about UPLFLN-P objective lenses
> Click here for details about PLN-P / ACHN-P objective lenses
| ■: Possible | Reflected light | Transmitted light | Sample height | |
| 1 | BX53MRF-S | ■ | 0-65 mm | |
| 2 | BX53MTRF-S | ■ | ■ | 0-35 mm |
| 3 | BX3M-ARMAD | ■ | ■ | +40 mm |
| 1 | BXFM-F | Frame interface is wall mounting/32 mm pillar |
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| 2 | BX3M-ILH | Illuminator holder |
| 3 | BXFM-ILHSPU | Counter spring for BXFM |
| 6 | SZ-STL | Large stand |
Unit Combination
Required: (1, 2 and 6)
Option: 3
| 1 | BXFM-F | Frame interface is wall mounting/32 mm pillar |
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| 4 | BXFM-ILHS | U-KMAS holder |
| 5 | U-ST | Stand |
| 6 | SZ-STL | Large stand |
Unit Combination
Required: (1, 4 and 5) or (1, 4 and 6)
Option: -
| FN | Type | Angle type | Image | Number of diopter adjustment mechanisms | ||
| 1 | U-BI30-2 | 22 | Binocular | Fixing | Reverse | 1 |
| 2 | U-TBI-3 | 22 | Binocular | Tilting | Reverse | 1 |
| 3 | U-TR30-2 | 22 | Trinocular | Fixing | Reverse | 1 |
| 4 | U-TR30IR | 22 | Trinocular for IR | Fixing | Reverse | 2 |
| 5 | U-ETR-4 | 22 | Trinocular | Fixing | Erect | 2 |
| 6 | U-TTR-2 | 22 | Trinocular | Tilting | Reverse | 2 |
| 7 | U-SWTR-3 | 26.5 | Trinocular | Fixing | Reverse | 2 |
| 8 | U-SWETTR-5 | 26.5 | Trinocular | Tilting | Erect | 2 |
| 9 | U-TLU | 22 | Single port | - | - | - |
| 10 | U-TLUIR | 22 | Single port for IR | - | - | - |
| ■: Possible | Coded function | Light source | BF | DF | DIC | POL | IR | FL | MIX | AS/FS | |
| 1 | BX3M-RLAS-S | Fixed 3 cube position | LED - Built in | ■ | ■ | ■ | ■ | - | - | ■ | ■ |
| 2 | BX3M-URAS-S | Attachable 4 cube position | LED | ■ | ■ | ■ | ■ | - | - | ■ | ■ |
| Halogen | ■ | ■ | ■ | ■ | ■ | - | ■ | ■ | |||
| Mercury/Light guide | ■ | ■ | ■ | ■ | - | ■ | ■ | ■ | |||
| 3 | BX3M-RLA-S | LED | ■ | ■ | ■ | ■ | - | - | ■ | ■ | |
| Halogen | ■ | ■ | ■ | ■ | ■ | - | ■ | ■ | |||
| 4 | BX3M-KMA-S | LED - Built in | ■ | - | ■ | ■ | - | - | ■ | - | |
| 5 | BX3-ARM | Mechanical arm for transmitted light | - | - | - | - | - | - | - | - | |
| 6 | U-KMAS | LED | ■ | - | ■ | ■ | - | - | ■ | - | |
| Halogen | ■ | - | ■ | ■ | ■ | - | ■ | - | |||
| 1 | BX3M-LEDR | LED lamp housing for reflected light |
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| 2 | U-RCV | DF converter for BX3M-URAS-S, required for observation with DF and BF when necessary |
| 3 | BX3M-PSLED | Power supply for LED lamp housing, requires BXFM system |
| 4 | BX3M-LEDT | LED lamp housing for transmitted light |
Unit Combination
Required: (1 and 3) or 4*1
Option: 2
*1：Only using BX53MTRF-frame
| 5 | U-LLGAD | Light guide adapter |
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| 2 | U-RCV |
DF converter for BX3M-URAS-S, required for observation
with DF and BF when necessary |
| 6, 7 | U-LLG150 (300) | Light guide, length:1.5 m (3 m) |
| 8 | U-HGLGPS | Light source for fluorescence |
| 9, 10 | U-LH100HG(HGAPO) | Mercury lamp housing for fluorescence |
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| 2 | U-RCV | DF converter for BX3M-URAS-S, required for observation with DF and BF when necessary |
| 11 | U-RFL-T | Power supply for 100W mercury lamp |
| 12 | U-LH100L-3 | Halogen lamp housing |
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| 13 | U-LH100IR | Halogen lamp housing for IR |
| 14 | U-RMT | Extender cable for halogen lamp housing, cable length 1.7 m (requires cable extension when necessary) |
| 15, 16 | TH4-100 (200) | 100V (200V) specification power supply for 100W/50W halogen lamp |
| 17 | TH4-HS | Hand switch for light intensity of halogen (dimmer TH4-100 (200) without hand switch) |
| ■: Possible | Type | Holes | BF | DF | EIC | MIX | ESD | Number of centering holes | |
| 1 | U-P4RE | Manual | 4 | ■ | 4 | ||||
| 2 | U-5RE-2 | Manual | 5 | ■ | |||||
| 3 | U-5RES-ESD | Coded | 5 | ■ | ■ | ||||
| 4 | U-D6RE | Manual | 6 | ■ | ■ | ||||
| 5 | U-D6RE-ESD-2 | Manual | 6 | ■ | ■ | ■ | |||
| 6 | U-P6RE | Manual | 6 | ■ | ■ | 2 | |||
| 7 | U-D7RE | Manual | 7 | ■ | ■ | ||||
| 8 | U-D6RES | Coded | 6 | ■ | ■ | ||||
| 9 | U-D7RES | Coded | 7 | ■ | ■ | ||||
| 10 | U-D5BDREMC | Motorized | 5 | ■ | ■ | ■ | ■ | ||
| 11 | U-5BDRE | Manual | 5 | ■ | ■ | ||||
| 12 | U-D5BDRE | Manual | 5 | ■ | ■ | ■ | ■ | ||
| 13 | U-P5BDRE | Manual | 5 | ■ | ■ | ■ | ■ | 2 | |
| 14 | U-D6BDRE | Manual | 6 | ■ | ■ | ■ | ■ | ||
| 15 | U-D5BDRES-ESD | Coded | 5 | ■ | ■ | ■ | ■ | ■ | |
| 16 | U-D6BDRES-S | Coded | 6 | ■ | ■ | ■ | ■ | ■ | |
| 17 | U-D6REMC | Motorized | 6 | ■ | ■ | ■ | ■ | ||
| 18 | U-D6BDREMC | Motorized | 6 | ■ | ■ | ■ | ■ | ||
| Type | Amount of shear | Available objectives | ||
| 1 | U-DICR | Standard | Medium | MPLFLN, MPLAPON, LMPLFLN, and LCPLFLN-LCD |
| 2 | U-DICRH | Resolution | Small | MPLFLN, MPLAPON |
| 3 | U-DICRHC | Contrast | Large | LMPLFLN and LCPLFLN-LCD |
MIX slider for MIX observation.
| Type | Available objectives | ||
| 4 | U-MIXR | MIX slider | MPLFLN-BD, LMPLFLN-BD, MPLN-BD |
| 1 | BX3M-CB | Control box for BX53M system |
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| 2 | BX3M-CBFM | Control box for BXFM system |
| 3 | BX3M-HS | MIX observation control, indicator of coded hardware, programmable function button of software (Stream) |
| 4 | BX3M-HSRE | Motorized nosepiece rotation |
| 5 | U-HSEXP | Shutter operation of camera |
Unit Combination
Required: 1 or 2
Option: 3, 4, 5
| 6 | U-CBS | Control box for coded functions in BXFM configuration |
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| 5 | U-HSEXP | Shutter operation of camera |
Unit Combination
Required: 6
Option: 5
| – | U-MIXRCBL (ECBL) | U-MIXR cable, cable length: 0.5 m (2.9 m) |
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| – | BX3M-RMCBL (ECBL) | Motorized nosepiece cable, cable length: 0.2 m (2.9 m) |
| 1 | U-SIC64 | 150 mm × 100 mm flat top handle stage |
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| 2 | U-SHG (T) | Silicone rubber operability handle rubber for improvement (thick type) |
| 3 | U-SP64 | Stage plate for U-SIC64 |
| 4 | U-WHP64 | Wafer plate for U-SIC64 |
| 5 | BH2-WHR43 | Wafer holder for 4-3 in. |
| 6 | BH2-WHR54 | Wafer holder for 5-4 in. |
| 7 | BH2-WHR65 | Wafer holder for 6-5 in. |
| 8 | U-SPG64 | Glass plate for U-SIC64 |
Unit Combination
Required: (1 and 3) or (1 and 8) or (1, 4 and 5) or (1, 4, and 6) or (1, 4 and 7*1)
Option: 2
*1：Only using U-WHP64 unit
| 9, 10 | U-SIC4R (L) 2 | 105 mm × 100 mm right (left) handle stage |
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| 11 | U-MSSP4 | Stage plate for U-SIC4R (L) 2 |
| 12 | U-WHP2 | Wafer plate for U-SIC4R (L) 2 |
| 6 | BH2-WHR43 | Wafer holder for 4-3 in. |
| 13 | U-MSSPG | Glass plate for U-SIC4R |
Unit Combination
Required: (9 and 11) or (9 and 12) or (9, 11 and 12) or (10 and 11) or (10 and 13) or (10, 11 and 12)
Option: -
| 14, 15 | U-SVR (L) M | 76 mm × 52 mm right (left) handle stage |
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| 2 | U-SHG (T) | Silicone rubber operability handle rubber for improvement (thick type) |
| 16 | U-MSSP | Stage plate for U-SVR (/L) M |
| 17, 18 | U-HR (L) D-4 | Thin slide holder for the right (left) opening |
| 19, 20 | U-HR (L) DT-4 |
Thick slide holder for the right (left) opening, for pressing the slide glass
to stage top surface, the specimen is difficult to lift. |
Unit Combination
Required: (14, 16, 17 and 19) or (14, 16, 17 and 20) or (14, 16, 18 and 19) or (14, 16, 18 and 20) or (15, 16, 17 and 19) or (15, 16, 17 and 20) or (15, 16, 18 and 19) or (15, 16, 18 and 20)
Option: 2
| 21 | U-SRG2 | Rotatable stage |
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| 22 | U-SRP | Rotatable stage for POL, from any position can be 45° click stop |
| 23 | U-FMP | Mechanical stage for U-SRP/U-SRG2 |
Unit Combination
Required: (21 and 24) or (22 and 24)
Option: 23
| 1 | U-SP | Fixed stage of a single plate |
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| Magnification | Centering adjustment | CCD image area (field number) | ||||
| 2/3 inch | 1/1.8 inch | 1/2 inch | ||||
| 1 | U-TV1x-2 with U-CMAD3 | 1 | - | 10.7 | 8.8 | 8 |
| 2 | U-TV1xC | 1 | ø2 mm | 10.7 | 8.8 | 8 |
| 3 | U-TV0.63xC | 0.63 | - | 17 | 14 | 12.7 |
| 4 | U-TV0.5xC-3 | 0.5 | - | 21.4 | 17.6 | 16 |
| 5 | U-TV0.35xC-2 | 0.35 | - | - | - | 22 |
| 6 | U-TV0.25xC | 0.25 | - | - | - | - |
| ■: Possible | FN | Diopter adjustment mechanism | Built-in cross reticle | |
| 1 | WHN10x | 22 | ||
| 2 | WHN10x-H | 22 | ■ | |
| 3 | CROSS WHN10x | 22 | ■ | ■ |
| 4 | SWH10x-H | 26.5 | ■ | |
| 5 | CROSS SWH10x | 26.5 | ■ | ■ |
| BF, DF, FL > 1, 2, 3 > U-25ND50, 25,6 | Neutral density filter, transmittance 50%, 25%, 6% |
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| BF, DF, FL > 4 > U-25LBD | Daylight color filter |
| BF, DF, FL > 5 > U-25LBA | Halogen color filter |
| BF, DF, FL > 6 > U-25IF550 | Green filter |
| BF, DF, FL > 7 > U-25L42 | UV-cut filter |
| BF, DF, FL > 8 > U-25Y48 | Yellow filter |
| BF, DF, FL > 9 > U-25FR | Frost filter (Required for the BX3M-URAS-S) |
| POL, DIC > 10 > U-AN-2 | Polarization direction is fixed |
| POL, DIC > 11 > U-AN360-3 | Polarization direction is rotatable |
| POL, DIC > 12 > U-AN360P-2 | High quality polarization direction is rotatable |
| POL, DIC > 13 > U-PO3 | Polarization direction is fixed |
| POL, DIC > 14 > U-POTP3 | Polarization direction is fixed, for use with U-DICRH |
| POL, DIC > 15 > 45-IF546 | Green ø45mm filter for POL |
| IR > 16 > U-AN360IR | IR polarization direction is rotatable (reduces halation at IR observation when using combination with U-AN360IR and U-POIR) |
| IR > 17 > U-POIR | IR polarization direction is fixed |
| IR > 18 > U-BP1100IR | Band pass filter: 1100 nm |
| IR > 19 > U-BP1200IR | Band pass filter: 1200 nm |
| Transmitted light* > 20 > 43IF550-W45 | Green ø45 mm filter |
| Transmitted light* > 21 > U-POT | Polarizer filter |
| Other > 22 > U-25 | Empty filter, for use with user's ø25 mm filters |
| Other > 23 > U-FC | Transmitted filter cassette; used by combining o45 mm filters |
*AN and PO are not necessary when using BX3M-RLAS-S and U-FDICR
| 1 > U-AC2 | Abbe condenser (available from 5x objectives) |
|---|---|
| 2 > U-SC3 | Swing-out condenser (available from 1.25x objectives) |
| 3 > U-LWCD | Long working distance condenser for glass plate (U-MSSPG, U-SPG64) |
| 4 > U-POC-2 | Swing-out condenser for POL |
| 1 > U-FBF | For BF, detachable ND filter |
|---|---|
| 2 > U-FDF | For DF |
| 3 > U-FDICR | For POL, crossed nicol position is fixed |
| 4 > U-FBFL |
For BF, built-in ND filter (It is necessary to use both BF* and FL)
*For coaxial episcopic illumination only |
| 5 > U-FWUS | For Ultra Violet-FL BP330-385 BA420 DM400 |
| 6 > U-FWBS | For Blue-FL BP460-490 BA520IF DM500 |
| 7 > U-FWGS | For Green FL BP510-550 BA590 DM570 |
| 8 > U-FF | Empty mirror unit, Used user’s optical element |
| 1 > U-CA | Magnification changer (1x, 1.25x, 1.6x, 2x) |
|---|---|
| 2 > U-ECA | Magnification changer (1x, 2x) |
| 3 > U-EPA2 | Eye point adjuster: + 30 mm |
| 4 > U-DP | Dual port for U-DP1xC |
| 5 > U-DP1xC | C-mount TV camera adapter for U-DP |
| 6 > U-TRU | Trinocular intermediate unit |
Objectives magnify the sample. Select the objective that matches the working distance, resolving power and observation method for the application.
There are just a few examples of what can be achieved using different observation methods.
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Darkfield | MIX (Brightfield + Darkfield) |
Darkfield is used for detecting minute scratches or flaws on a sample or inspecting samples with mirrored surfaces, such as wafers.
MIX illumination enables users to view both patterns and colors.
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Fluorescence | MIX (Fluorescence + Darkfield) |
Fluorescence is used for samples that emit light when illuminated with a specially designed filter cube. This is used to detect contamination and photoresist residue.
MIX illumination enables the observation of both the photoresist residue and IC pattern.
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Transmitted Light | MIX (Transmitted Light + Brightfield) |
This observation technique is suitable for transparent samples such as LCDs, plastics, and glass materials.
MIX illumination enables the observation of both the filter color and circuit pattern.
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Brightfield | Differential Interference Contrast (DIC) |
DIC is an observation technique where the height of a sample is visible as a relief, similar to a 3D image with improved contrast; it is ideal for inspections of samples that have very minute height differences, including metallurgical structures and minerals.
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Brightfield | Polarized Light |
Differential interference contrast (DIC) is an observation technique where the height of a sample, normally not detectable in brightfield, is visible as a relief, similar to a 3D image with improved contrast. It is ideal for inspections of samples that have very minute height differences, including metallurgical structures and minerals.
Infrared (IR)
IR is used to look for defects inside IC chips and other devices made with silicon on glass.
| BX53MTRF-S | BX53MRF-S | BXFM | ||
| Optical system | UIS2 optical system (infinity-corrected) | |||
| Microscope frame | Illumination | Reflected/transmitted | Reflected | |
| Focus |
Stroke: 25 mm
Fine stroke per rotation: 100 μm Minimum graduation: 1 μm With upper limit stopper, torque adjustment for coarse handle |
Stroke: 30 mm
Fine stroke per rotation: 200 μm Minimum graduation: 2 μm With torque adjustment for coarse handle | ||
| Max. specimen height |
35 mm (w/o spacer)
75 mm (with BX3M-ARMAD) |
65 mm (w/o spacer)
105 mm (with BX3M-ARMAD) | Depends on the mounting configuration | |
| Observation tube | Wide-field FN 22 |
Inverted: binocular, trinocular, tilting binocular
Erect: trinocular, tilting binocular | ||
| Super-wide-field FN 26.5 |
Inverted: trinocular
Erect: trinocular, tilting trinocular | |||
| Reflected light illumination | Traditional observation technique |
BX3M-RLAS-S
Coded, white LED, BF/DF/DIC/POL/MIX FS, AS (with centering mechanism) BX3M-KMA-S White LED, BF/DIC/POL/MIX FS, AS (with centering mechanism) BX3M-RLA-S 100W halogen lamp, white LED, BF/DF/DIC/POL/MIX/ FS, AS (with centering mechanism), BF/DF interlocking, ND filter | ||
| - |
U-KMAS
White LED, 100W halogen Fiber illumination, BF/DIC/POL/MIX | |||
| Fluorescence |
BX3M-URAS-S
Coded, 100W mercury lamp, 4 position mirror unit turret, (standard: WB, WG, WU+BF etc) With FS, AS (with centering mechanism), with shutter mechanism | |||
| Transmitted light |
White LED
Abbe/long working distance condensers | - | ||
| Revolving nosepiece | For BF | Sextuple, centering sextuple, septuple, coded quintuple (optional motorized revolving nosepieces) | ||
| For BF/DF | Sextuple, quintuple, centering quintuple, coded quintuple (optional motorized revolving nosepieces) | |||
| Stage |
Coaxial left (right) handle stage:
76 mm × 52 mm, with torque adjustment Large-size coaxial left (right) handle stage: 105 mm × 100 mm, with locking mechanism in Y-axis Large-size coaxial right handle stage: 150 mm × 100 mm, with torque adjustment and locking mechanism in Y-axis | - | ||
| Weight |
Approx. 18.3 kg
(Microscope frame 7.6 kg) |
Approx. 15.8 kg
(Microscope frame 7.4 kg) |
Approx. 11.1 kg
(Microscope frame 1.9 kg) | |
| BX53MRF-S | BXFM | ||
| IR Observation tube | Wide field FN 22 | Inverted: trinocular | |
| Reflected light illumination | IR observation |
BX3M-RLA-S
100W halogen lamp for IR, BF/IR, AS (with centering mechanism) BX3M-URAS-S 100W halogen lamp for IR, BF/IR, AS (with centering mechanism) | |
| – |
U-KMAS
100W halogen for IR, BF/IR | ||
| Revolving nosepiece | For BF | Sextuple, centering sextuple, septuple, coded quintuple (optional motorized revolving nosepieces) | |
| Stage (X × Y) |
Coaxial left (right) handle stage:
76 mm × 52 mm, with torque adjustment Large-size coaxial left (right) handle stage: 105 mm × 100 mm, with locking mechanism in Y-axis Large-size coaxial right handle stage: 150 mm × 100 mm, with torque adjustment and locking mechanism in Y-axis | – | |
| Weight | Approx. 18.9 kg (Microscope frame 7.4 kg) | Approx. 11.6 kg (Microscope frame 1.9 kg) | |
| BX53MTRF-S | ||
|
Polarized light intermediate attachment
(U-CPA or U-OPA) | Wide field FN 22 |
Inverted: binocular, trinocular, tilting binocular
Erect: trinocular, tilting binocular |
| Bertrand lens | Focusable (for U-CPA only) | |
| Bertrand field stop | ø3.4 mm diameter (fixed) (for U-CPA only) | |
| Engage or disengage Bertrand lens changeover between orthoscopic and conoscopic observation |
Position of slider ● in
Position of slider ○ out (for U-CPA only) | |
| Analyzer Slot | Rotatable analyzer with slot (U-AN360P-2) | |
| Analyzer (U-AN360P-2) |
360° dial-rotatable
Rotatable minimum angle 0.1° | |
| Revolving centerable nosepiece (U-P4RE) |
Quadruple, centerable attachable components: 1/4 wavelength retardation plate (U-TAD),
tint plate (U-TP530) and various compensators can be attached using plate adapter (U-TAD) | |
| Stage (U-SRP) |
Polarizing rotatable stage with 3-point centering function
360° rotatable, lockable in any position, 360° graduated in 1° increments (minimum retardation resolution 6', using vernier scale) 45° click stop function Mechanical stage (U-FMP) can be attached | |
| Condenser (U-POC-2) |
Achromat strain-free condenser (U-POC-2), 360° rotatable polarizer with swing-out achromatic top-lens
Click stop at position "0°" is adjustable NA 0.9 (top-lens in) NA 0.18 (top-lens out) Aperture iris diaphragm: adjustable from 2 mm to 21 mm diameters | |
| Weight | Approx. 16.2 kg (Microscope frame 7.6 kg) | |
| Items |
Microscope frame: BX53MRF-S, BX53MTRF-S
Illuminator: BX3M-KMA-S, BX3M-RLA-S, BX3M-URAS-S, BX3M-RLAS-S Nosepiece: U-D6BDRES-S, U-D6RE-ESD, U-D5BDREMC-ESD, U-5RES-ESD Stage: U-SIC4R2, U-SIC4L2, U-MSSP4 |
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