Overview

Advanced Microscopy Simplified Designed with modularity in mind, the BX3M series provide versatility for a wide variety of materials science and industrial applications. With improved integration with PRECiV software, the BX53M provides a seamless workflow for standard microscopy and digital imaging users from observation to report creation. Experience BX53M

Advanced Microscopy Simplified

Designed with modularity in mind, the BX3M series provide versatility for a wide variety of materials science and industrial applications. With improved integration with PRECiV software, the BX53M provides a seamless workflow for standard microscopy and digital imaging users from observation to report creation.

Experience BX53M

	Choose the Best Model Six BX53M suggested configuration provide you with flexibility to choose the features that you need. For General use: Entry, Standard, Advanced For Dedicated use: Fluorescence, Infrared, Polarization Various configurations to meet users' requirements Modular Design, Build Your System Your Way See More

Choose the Best Model

Six BX53M suggested configuration provide you with flexibility to choose the features that you need.

For General use: Entry, Standard, Advanced
For Dedicated use: Fluorescence, Infrared, Polarization
Various configurations to meet users' requirements
Modular Design, Build Your System Your Way

See More

Comfortable and Easy to Use The BX53M simplifies complex microscopy tasks through its well-designed and easy-to-use controls. Users can get the most out of the microscope without the need for extensive training. The easy, comfortable operation of the BX53M also improves reproducibility by minimizing human error. Simple Illuminator Intuitive Microscope Controls Find the Focus Quickly Consistent Illumination Easy and Ergonomic Operation Easy Restore Microscope Settings Basic Measurement Functions See More

Comfortable and Easy to Use

The BX53M simplifies complex microscopy tasks through its well-designed and easy-to-use controls. Users can get the most out of the microscope without the need for extensive training. The easy, comfortable operation of the BX53M also improves reproducibility by minimizing human error.

Simple Illuminator
Intuitive Microscope Controls
Find the Focus Quickly
Consistent Illumination
Easy and Ergonomic Operation
Easy Restore Microscope Settings
Basic Measurement Functions

See More

	Functional The BX53M maintains the traditional contrast methods of conventional microscopy, such as brightfield, darkfield, polarized light, and differential interference contrast. As new materials are developed, many of the difficulties associated with detecting defects using standard contrast methods can be solved using advanced microscopy techniques for more accurate and reliable inspections. New illumination techniques and options for image acquisition within PRECiV image analysis software give users more choices of how to evaluate their samples and document findings. The Invisible Becomes Visible Create All-in-focus Images Easily Move the Stage for Panorama Capture Both Bright and Dark Areas Adaptable to Suit Observational and Analysis Preferences Accommodates a Wide Range of Samples See More

Functional

The BX53M maintains the traditional contrast methods of conventional microscopy, such as brightfield, darkfield, polarized light, and differential interference contrast. As new materials are developed, many of the difficulties associated with detecting defects using standard contrast methods can be solved using advanced microscopy techniques for more accurate and reliable inspections. New illumination techniques and options for image acquisition within PRECiV image analysis software give users more choices of how to evaluate their samples and document findings.

The Invisible Becomes Visible
Create All-in-focus Images
Easily Move the Stage for Panorama
Capture Both Bright and Dark Areas
Adaptable to Suit Observational and Analysis Preferences
Accommodates a Wide Range of Samples

See More

Leading-Edge Optics

Olympus’ history of developing high-quality optics has resulted in a record of proven optical quality and microscopes that offer excellent measurement accuracy.

Superior Optical Performance
Stable Color Temperature and High-Intensity White LED Illumination
Support Precise Measurement
Seamless Stitching

See More

_{Wave Front Aberration Control}

_{Bad wavefront}

Good Wave (Wave Front Aberration Control)

_{Good wavefront (UIS2 objective)}

Configurations

Highly Reliable Modular System Concept
Never in This Simplicity

Six BX53M suggested configurations provide you with flexibility to choose the features that you need.

General Use			Dedicated Use

Entry Easy setup with basic features	Standard Simple to use with versatile upgrades	Advanced Supports numerous advanced features	Fluorescence Ideally suited for Fluorescence observation	Infrared Designed to use Infrared observation to inspect integrated circuits	Polarization Designed for observing birefringence characteristics
_{LCD color filter} ^{(Transmitted/BF)}	_{Microstructure with ferritic} ^grains ^{(Reflected/DF)}	_{Copper wire of coil} ^{(BF + DF/MIX)}	_{Resist on IC pattern} ^{(FL + DF/MIX)}	_{Silicon layering IC pattern} ^(IR)	_Asbestos ^(POL)

See Specification Chart

	Entry	Standard	Advanced	Fluorescence	Infrared	Polarization
Microscope frame	Reflected or Reflected/Transmitted		Reflected or Reflected/Transmitted		Reflected	Transmitted
Standard	R-BF or T-BF	R-BF or T-BF or DF	R-BF or T-BF or DF or MIX	R-BF or T-BF or DF or FL	R-BF or IR	T-BF or POL
Option	DIC	DIC/MIX	DIC	DIC/MIX	－	－
Simple illuminator	－			－	－	－
Aperture legend	－				－
Coded hardware	－				－
Focus scale index
Light intensity manager				－	－
Hand switch operation					－	－
MIX observation					－	－
Objectives	Select from 3 objectives based on your applications		Select from 3 objectives based on your applications		Objectives for IR	Objectives for POL
Stage	Select from 5 stages based on the size of your samples		Select from 5 stages based on the size of your samples			Stage for POL

OBSERVATION METHOD

R-BF: Brightfield (Reflected)
T-BF: Brightfield (Reflected/Transmitted)
DF: Darkfield
DIC: Differential interference contrast / Simple polarization
MIX: MIX
FL: Fluorescence
IR: Infrared
POL: Polarization

_{*T-BF can be used when selecting Reflected/Transmitted microscope frame.}

: Standard
: Option

Example Configurations for Materials Science

Modular design enables various configurations to meet users’ requirements.
Below you can find some examples of configuration for materials science.

BX53M Reflected and Reflected/Transmitted Light Combination There are two types of microscope frames in the BX3M series, one for reflected light only and one for both reflected and transmitted light. Both frames can be configured with manual, coded, or motorized components. The frames are outfitted with ESD capability to protect electronic samples.	_{BX53MRF-S example configuration}	_{BX53MTRF-S example configuration}

BX53M Reflected and Reflected/Transmitted Light Combination

There are two types of microscope frames in the BX3M series, one for reflected light only and one for both reflected and transmitted light. Both frames can be configured with manual, coded, or motorized components. The frames are outfitted with ESD capability to protect electronic samples.

BX53MRF-S example configuration

_{BX53MRF-S example configuration}

BX53MTRF-S example configuration

_{BX53MTRF-S example configuration}

	BX53M IR Combination IR objectives can be used for semiconductor inspection, measurement, and processing applications where imaging through silicon is required to see the pattern. 5X to 100X infrared (IR) objectives are available with chromatic aberration correction from visible light wavelengths through the near infrared. For high magnification work, rotating the correction collar of the LCPLNIR series of lenses corrects for aberrations caused by sample thickness. A clear image is obtained with a single objective. Click here for details about IR objective lenses

BX53M IR Combination

IR objectives can be used for semiconductor inspection, measurement, and processing applications where imaging through silicon is required to see the pattern. 5X to 100X infrared (IR) objectives are available with chromatic aberration correction from visible light wavelengths through the near infrared. For high magnification work, rotating the correction collar of the LCPLNIR series of lenses corrects for aberrations caused by sample thickness. A clear image is obtained with a single objective.

Click here for details about IR objective lenses

BX53M Polarized Light Combination The optics of the BX53M polarized light provide geologists with the right tools for high-contrast polarized light imaging. Applications such as mineral identification, investigating the optical characteristics of crystals, and observing solid rock sections benefit from system stability and precise optical alignment.	_{BX53-P orthoscopic configuration}	_{BX53-P conoscopic/orthoscopic configuration}

BX53M Polarized Light Combination

The optics of the BX53M polarized light provide geologists with the right tools for high-contrast polarized light imaging. Applications such as mineral identification, investigating the optical characteristics of crystals, and observing solid rock sections benefit from system stability and precise optical alignment.

BX53-P orthoscopic configuration

_{BX53-P orthoscopic configuration}

BX53-P conoscopic/orthoscopic configuration

_{BX53-P conoscopic/orthoscopic configuration}

Bertrand Lens for Conoscopic and Orthoscopic Observations With a U-CPA conoscopic observation attachment, switching between orthoscopic and conoscopic observation is simple and fast. It is focusable for clear back focal plane interference patterns. The Bertrand field stop makes it possible to obtain consistently sharp and clear conoscopic images.

Bertrand Lens for Conoscopic and Orthoscopic Observations

With a U-CPA conoscopic observation attachment, switching between orthoscopic and conoscopic observation is simple and fast. It is focusable for clear back focal plane interference patterns. The Bertrand field stop makes it possible to obtain consistently sharp and clear conoscopic images.

	An Extensive Range of Compensator and Wave Plates Six different compensators are available for measurements of birefringence in rock and mineral thin sections. Measurement retardation level ranges from 0 to 20λ. For easier measurement and high image contrast, the Berek and Senarmont compensators can be used, which change the retardation level in the entire field of view.

An Extensive Range of Compensator and Wave Plates

Six different compensators are available for measurements of birefringence in rock and mineral thin sections. Measurement retardation level ranges from 0 to 20λ. For easier measurement and high image contrast, the Berek and Senarmont compensators can be used, which change the retardation level in the entire field of view.

Measuring Range of Compensators

Compensator	Measuring Range	Major Application
Thick Berek (U-CTB)	0 to 11,000 nm (20 λ)	Measurement of High Retardation Level (R^*>3λ) (crystals, macromolecules, fiber, etc.)
Berek (U-CBE)	0 to 1,640 nm (3 λ)	Measurement of Retardation Level (crystals, macromolecules, living organisms, etc.)
Senarmont Compensator (U-CSE)	0 to 546 nm (1 λ)	Measurement of Retardation Level (crystals, living organisms, etc.) Enhancement of Image Contrast (living organisms, etc.)
Brace-Koehler Compensator 1/10λ (U-CBR1)	0 to 55 nm (1/10 λ)	Measurement of Low Retardation Level (living organisms, etc.) Enhancement of Image Contrast (living organisms, etc.)
Brace-Koehler Compensator 1/30λ (U-CBE2)	0 to 20 nm (1/30 λ)	Measurement of image contrast (living organisms, etc.)
Quartz Wedge (U-CWE2)	500 to 2,200 nm (4 λ)	Approximate Measurement of Retardation Level (crystal, macromolecules, etc.)

_{*R = retardation level}
_{For more accurate measurement, it is recommended that compensators (except U-CWE2) be used together with the interference filter 45-IF546.}

Strain Free Optics

Thanks to Olympus’ sophisticated design and manufacturing technology, the UPLFLN-P strainfree objectives reduce internal strain to the minimum. This means a higher EF value, resulting in excellent image contrast.

Click here for details about UPLFLN-P objective lenses

Click here for details about PLN-P / ACHN-P objective lenses

	BXFM System The BXFM can be adapted to special applications or integrated into other instruments. The modular construction provides for straightforward adaptation to unique environments and configurations with a variety of special small illuminators and fixturing mounts.

BXFM System

The BXFM can be adapted to special applications or integrated into other instruments. The modular construction provides for straightforward adaptation to unique environments and configurations with a variety of special small illuminators and fixturing mounts.

Modular Design, Build Your System Your Way

Microscope Frames

There are two microscope frames for reflected light, one also has transmitted Light; capability. An adapter is available to raise the illuminator to accommodate taller samples.

		Reflected light	Transmitted light	Sample height
1	BX53MRF-S	■	－	0 to 65 mm
2	BX53MTRF-S	■	■	0 to 35 mm
1, 3	BX53MRF-S + BX3M-ARMAD	■	－	40 to 105 mm
2, 3	BX53MTRF-S + BX3M-ARMAD	■	■	40 to 75 mm

Convenient Accessories for Microscopy use

－	HP-2	Hand press
－	COVER-018	Dust cover

Microscope Frames

Stands

For microscopy applications where the sample will not fit on a stage, the illuminator and optics can be mounted to a larger stand or to another piece of equipment.

BXFM + BX53M Illuminator Configuration

1	BXFM-F	Frame interface is wall mounting 32 mm pillar
2	BX3M-ILH	Illuminator holder
3	BXFM-ILHSPU	Counter spring for BXFM
5	SZ-STL	Large stand

BXFM + U-KMAS Illuminator Configuration

1	BXFM-F	Frame interface is wall mounting 32 mm pillar
4	BXFM-ILHS	U-KMAS holder
5	SZ-STL	Large stand

Stands

Tubes

For microscope imaging with eyepieces or for camera observation, select tubes by imaging type and operator’s posture during observation.

		FN	Type	Angle type	Image	Number of diopter adjustment mechanisms
1	U-TR30-2	22	Trinocular	Fixing	Reverse	1
2	U-TR30IR	22	Trinocular for IR	Fixing	Reverse	1
3	U-ETR-4	22	Trinocular	Fixing	Erect	－
4	U-TTR-2	22	Trinocular	Tilting	Reverse	－
5	U-SWTR-3	26.5	Trinocular	Fixing	Reverse	－
6	U-SWETTR-5	26.5	Trinocular	Tilting	Erect	－
7	U-TLU	22	Single port	－	－	－
8	U-SWATLU	26.5	Single port	－	－	－

Illuminators

The illuminator projects light onto the sample based on the observation method selected. Software interfaces with coded illuminators to read the cube position and automatically recognize the observation method.

		Coded function	Light source	BF	DF	DIC	POL	IR	FL	MIX	AS/FS
1	BX3M-RLAS-S	Fixed 3 cube position	LED - Built in	■	■	■	■	－	－	■	■
2	BX3M-URAS-S	Attachable 4 cube position	LED	■	■	■	■	－	－	■	■
			Halogen	■	■	■	■	■	－	■	■
			Mercury/Light guide	■	■	■	■	－	■	■	■
3	BX3M-RLA-S		LED	■	■	■	■	－	－	■	■
3	BX3M-RLA-S		Halogen	■	■	■	■	■	－	■	■
4	BX3M-KMA-S		LED - Built in	■	－	■	■	－	－	■	－
5	BX3-ARM	Mechanical arm for transmitted light
6	U-KMAS		LED	■	－	■	■	－	－	■	－
6	U-KMAS		Halogen	■	－	■	■	■	－	■	－

Light Sources

Light sources and power supplies for sample illumination, choose the appropriate light source for the observation method.

Standard LED Light Resource Configuration

1	BX3M-LEDR	LED lamp housing for reflected light
2	U-RCV	DF converter for BX3M-URAS-S, required for observation with DF and BF when necessary
3	BX3M-PSLED	Power supply for LED lamp housing, requires BXFM system
4	BX3M-LEDT	LED lamp housing for transmitted light

Fluorescence Light Resource Configuration

5	U-LLGAD	Light guide adapter
2	U-RCV	DF converter for BX3M-URAS-S, required for observation with DF when necessary
6	U-LLG150	Light guide, length: 1.5 m
7	U-LGPS	Light source for fluorescence
8, 9	U-LH100HG (HGAPO)	Mercury lamp housing for fluorescence
2	U-RCV	DF converter for BX3M-URAS-S, required for observation with DF when necessary
10	U-RFL-T	Power supply for 100W mercury lamp

Halogen and Halogen IR Light Resource Configuration

11	U-LH100IR	Halogen lamp housing for IR
12	U-RMT	Extender cable for halogen lamp housing, cable length 1.7 m (requires cable extension when necessary)
13, 14	TH4-100 (200)	100V (200V) specification power supply for 100W/50W halogen lamp
15	TH4-HS	Hand switch for light intensity of halogen (dimmer TH4-100 (200) without hand switch)

Nosepieces

Attachment for objectives and sliders. Select by the number of objectives needed and types; also with/without slider attachment.

		Type	Holes	BF	DF	DIC	MIX	ESD	Number of centering holes
1	U-P4RE	Manual	4	■		■			4
2	U-5RE-2	Manual	5	■
3	U-5RES-ESD	Coded	5	■				■
4	U-D6RE	Manual	6	■		■
5	U-D6RES	Coded	6	■		■
6	U-D5BDREMC	Motorized	5	■	■	■	■
7	U-D6BDRE	Manual	6	■	■	■	■
8	U-D5BDRES-ESD	Coded	5	■	■	■	■	■
9	U-D6BDRES-S	Coded	6	■	■	■	■	■
10	U-D6REMC	Motorized	6	■		■
11	U-D6BDREMC	Motorized	6	■	■	■	■	■
12	U-D5BDREMC-VA	Motorized	5	■	■

Sliders

Select the slider to compliment traditional brighfield observation. The DIC slider provides topographic information about the sample with options to maximize contrast or resolution. The MIX slider provides illumination flexibility with a segmented LED source in the darkfield path.

DIC Slider

		Type	Amount of shear	Available objectives
1	U-DICR	Standard	Medium	MPLFLN, MPLAPON, LMPLFLN, and LCPLFLN-LCD

MIX Slider

		Available objectives
2	U-MIXR	MPLFLN-BD, LMPLFLN-BD, MPLN-BD

Cable

U-MIXRCBL*

U-MIXR cable, cable length: 0.5 m

_{*MIXR only}

Controls Box and Hand Switches

Control boxes for interfacing microscope hardware with a PC and hand switches for hardware display and control.

BX3M-CB (CBFM) Configuration

1	BX3M-CB	Control box for BX53M system
2	BX3M-CBFM	Control box for BXFM system
3	BX3M-HS	MIX observation control, indicator of coded hardware, programmable function button of software (Stream)
4	BX3M-HSRE	Motorized nosepiece rotation

Cable

－

BX3M-RMCBL (ECBL)

Motorized nosepiece cable, cable length: 0.2 m

Controls Box and Hand Switches

Stages

Stages and stage plates for sample placement. Select based on sample shape and size.

150 mm × 100 mm Stage Configuration

1	U-SIC64	150 mm × 100 mm flat top handle stage
2	U-SHG (T)	Silicone rubber operability handle rubber for improvement (thick type)
3	U-SP64	Stage plate for U-SIC64
4	U-WHP64	Wafer plate for U-SIC64
5	BH2-WHR43	Wafer holder for 4-3 in.
6	BH2-WHR54	Wafer holder for 5-4 in.
7	BH2-WHR65	Wafer holder for 6-5 in.
8	U-SPG64	Glass plate for U-SIC64

76 mm × 52 mm Stage Configuration

13	U-SVR M	76 mm × 52 mm right handle stage
2	U-SHG (T)	Silicone rubber operability handle rubber for improvement (thick type)
14	U-MSSP	Stage plate for U-SVR (/L) M
15, 16	U-HR (L) D-4	Thin slide holder for the right (left) opening
17, 18	U-HR (L) DT-4	Thick slide holder for the right (left) opening, for pressing the slide glass to stage top surface, the specimen is difficult to lift

100 mm × 100 mm Stage Configuration

9	U-SIC4R 2	105 mm × 100 mm right handle stage
10	U-MSSP4	Stage plate for U-SIC4R (L) 2
11	U-WHP2	Wafer plate for U-SIC4R (L) 2
6	BH2-WHR43	Wafer holder for 4-3 in.
12	U-MSSPG	Glass plate for U-SIC4R

Others

19	U-SRG2	Rotatable stage
20	U-SRP	Rotatable stage for POL, from any position can be 45° click stop
21	U-FMP	Mechanical stage for U-SRP/U-SRG2

Camera Adapters

Adapter for camera observation. Selectable from required field of view and magnification. Actual observation range can be calculated using this formula: actual field of view (diagonal mm) = viewing field (viewing number) ÷ objective magnification.

		Magnification	Centering adjustment	CCD image area (field number) mm
		Magnification	Centering adjustment	2/3 inch	1/1.8 inch	1/2 inch
1	U-TV1x-2 with U-CMAD3	1	－	10.7	8.8	8
2	U-TV1xC	1	ø2 mm	10.7	8.8	8
3	U-TV0.63xC	0.63	－	17	14	12.7
4	U-TV0.5xC-3	0.5	－	21.4	17.6	16
5	U-TV0.35xC-2	0.35	－	－	－	22
6	U-TV0.25xC	0.25	－	－	－	－

Eyepieces

Eyepiece for viewing directly into the microscope. Select based on desired field of view.

		FN (mm)	Diopter adjustment mechanism	Built-in cross reticle
1	WHN10x	22
2	WHN10x-H	22	■
3	CROSS WHN10x	22	■	■
4	SWH10x-H	26.5	■
5	CROSS SWH10x	26.5	■	■

Optical Filters

Optics filters convert sample exposure light to various types of illumination. Select the appropriate filter for observation requirements.

BF, DF, FL

1, 2	U-25ND25,6	Neutral density filter, transmittance 25%, 6%
3	U-25LBD	Daylight color filter
4	U-25LBA	Halogen color filter
5	U-25IF550	Green filter
6	U-25L42	UV-cut filter
7	U-25Y48	Yellow filter
8	U-25FR	Frost filter (Required for the BX3M-URAS-S)

POL, DIC

9	U-AN-2	Polarization direction is fixed
10	U-AN360-3	Polarization direction is rotatable
11	U-AN360P-2	High quality polarization direction is rotatable
12	U-PO3	Polarization direction is fixed
13	U-POTP3	Polarization direction is fixed, for use with U-DICRH
14	45-IF546	Green ø45mm filter for POL

IR

15	U-AN360IR	IR polarization direction is rotatable (reduces halation at IR observation when using combination with U-AN360IR and U-POIR)
16	U-POIR	IR polarization direction is fixed
17	U-BP1100IR	Band pass filter: 1100 nm
18	U-BP1200IR	Band pass filter: 1200 nm

Transmitted Light

19	43IF550-W45	Green ø45 mm filter
20	U-POT	Polarizer filter

Others

22

U-25

Empty filter, for use with user's ø25 mm filters

_{*AN and PO are not necessary when using BX3M-RLAS-S and U-FDICR}

Condensers

Condensers collect and focus transmitted light. Use for transmitted light observation.

1	U-AC2	Abbe condenser (available from 5x objectives)
2	U-SC3	Swing-out condenser (available from 1.25x objectives)
3	U-LWCD	Long working distance condenser for glass plate (U-MSSPG, U-SPG64)
4	U-POC-2	Swing-out condenser for POL

Mirror Units

Mirror unit for BX3M-URAS-S. Select the unit for required observation.

1	U-FBF	For BF, detachable ND filter
2	U-FDF	For DF
3	U-FDICR	For POL, crossed nicol position is fixed
4	U-FBFL	For BF, built-in ND filter (It is necessary to use both BF* and FL)
5	U-FWUS	For Ultra Violet-FL: BP330-385 BA420 DM400
6	U-FWBS	For Blue-FL: BP460-490 BA520IF DM500
7	U-FWGS	For Green FL: BP510-550 BA590 DM570
8	U-FF	Empty mirror unit

_{*For coaxial episcopic illumination only}

Intermediate Tubes

Various types of accessories for multiple purposes. For use between tube and illuminator.

1	U-CA	Magnification changer (1X, 1.25X, 1.6X, 2X)
2	U-TRU	Trinocular intermediate unit

UIS2 Objectives

Objectives magnify the sample. Select the objective that matches the working distance, resolving power and observation method for the application.

Click here for details about UIS2 objective lenses

Ease of Use

Traditional Techniques Made Easy:
Simple Illuminator

The illuminator minimizes complicated actions that are usually necessary during microscope operation. A dial at the front of the illuminator enables the user to easily change the observation method. An operator can quickly switch between the most frequently used observation methods in reflected light microscopy, such as from brightfield, to darkfield, to polarized light, in order to readily change between different types of analysis. In addition, simple polarized light observation is adjustable by rotating the analyzer.

Intuitive Microscope Controls:
Simple FS and AS Settings

Using the proper aperture stop and field stop settings provides good image contrast and makes full use of the numerical aperture of the objective. The legend guides the user to the correct setting based on the observation method and objective in use.

Find the Focus Quickly

The focus scale index on the frame supports quick access to the focal point. Operators can roughly adjust the focal point without viewing the sample through an eyepiece, saving time when inspecting samples that are different heights.

Hand switch for motorized nosepiece rotation

Easy and Comfortable Operation

A system design affects users' work efficiency. Both standalone microscope users and those integrating with PRECiV image analysis software benefit from convenient handset controls that clearly display the hardware position. The simple handsets enable the user to focus on their sample and the inspection they need to perform.

For Consistent Illumination:
Light Intensity Manager

During the initial setup, the illumination intensity can be adjusted to match the specific hardware configuration of the coded illuminator and/or coded nosepiece.

For Restoring Microscope Settings:
Coded Hardware

Coded functions integrate the system settings of the BX53M with OLYMPUS Stream image analysis software. The observation method, illumination intensity, and magnification are automatically recorded by the software and stored with the associated images. Since operators can always conduct inspections with the same observation settings, reliable inspection results can be delivered.

Functionality

The Invisible Becomes Visible:
MIX Observation

The BX53M’s MIX observation technology combines traditional illumination methods with darkfield illumination. When the MIX slider is used, its ring of LEDs shine directional darkfield on the sample. This has a similar effect to traditional darkfield, but provides the ability to select a quadrant of the LEDs in order to direct the light from different angles. This combination of directional darkfield and brightfield, fluorescence, or polarization is called MIX illumination, and is especially helpful to highlight defects and differentiate raised surfaces from depressions.

Create All-in-focus Images: EFI

The Extended Focus Imaging (EFI) function within PRECiV software captures images of samples whose height extends beyond the depth of focus of the objective and stacks them together to create one image that is all in focus. EFI can be executed with either a manual or motorized Z-axis and creates a height map for easy structure visualization. It is also possible to construct an EFI image while offline within Stream Desktop.

Capture Both Bright and Dark Areas: HDR

Using advanced image processing, high dynamic range (HDR) adjusts for differences in brightness within an image to reduce glare. HDR improves the visual quality of digital images thereby helping to generate professional-looking reports.

_{Clearly exposed for both of dark and bright parts by HDR (Sample: fuel injector bulb)}

_{Contrast enhancement by HDR

(Sample: Sliced magnesite)}

_{Instant MIA image of a coin}

Easily Move the Stage for Panorama: Instant MIA

You can now stitch images easily and quickly just by moving the XY knobs on the manual stage; no motorized stage is necessary. PRECiV software uses pattern recognition to generate a panoramic image giving users a wider field of view than a single frame.

Versatile Measurement Capability

Routine or Basic Measurement Functions

Various measurement functions are available through PRECiV so that the user can easily obtain useful data from the images. For quality control and inspection, measuring features on images are often required. All levels of PRECiV licenses include interactive measurement functions such as distances, angles, rectangles, circles, ellipses, and polygons. All measured results are saved with the image files for further documentation.

Count and Measure

Object detection and size distribution measurement are among the most important applications in digital imaging. PRECiV incorporates a detection engine that utilizes threshold methods to reliably separate objects (e.g., particles, scratches) from the background.

Materials Science Solutions

PRECiV offers an intuitive, workflow-oriented interface for complex image analysis. At the click of a button, the most complex image analysis tasks can be executed quickly, precisely, and in compliance with most common industrial standards. With a significant reduction in processing time for repeated tasks, materials scientists can concentrate on analysis and research. Modular add-ins for inclusions and intercept charts are easily performed at any time.

_{3D surface view (Roughness test sample)}

_{Single view and 3D profile measurement}

3D Sample Measurement

When using an external motorized focus drive, an EFI image can be quickly captured and displayed in 3D. The height data acquired can be used for 3D measurements on the profile or from the single view image.

Scheduled to be supported in PRECiV v.1.2.

Learn More about PRECiV

View More Sample Types and Sizes

The new 150 × 100 mm stage provides a longer travel in the X direction than previous models. This, together with the flat-top design, enables large samples or multiple samples to be easily placed on the stage. The stage plate has tapped holes to attach a sample holder. The larger stage provides flexibility to users by enabling them to inspect more samples on one microscope, saving valuable lab space. The stage’s adjustable torque facilitates fine positioning under high magnification with a narrow field of view.

Flexibility for Sample Height and Weight

Samples up to 105 mm can be mounted on the stage with the optional modular unit. Due to the improved focusing mechanism, the microscope can accommodate a total weight (sample + stage) of up to 6 kg. This means that larger and heavier samples can be inspected on the BX53M, so fewer microscopes are required in the lab. By strategically positioning a rotatable holder for 6-inch wafers off-center, users can observe the whole wafer surface by just rotating the holder when moving through the 100 mm travel range. The stage's torque adjustment is optimized for ease of use and the comfortable handle grip makes it easy to find the region of interest of the sample.

_BX53MRF-S

_BXFM

Flexibility for Sample Size

When samples are two large to place on a traditional microscope stage, the core optical components for reflected light microscopy can be configured in a modular configuration. This modular system, the BXFM, can be mounted to a larger stand via a pole or mounted to another instrument of choice using a mounting bracket. This enables users to take advantage of Olympus’ renowned optics even when their samples are unique in size or shape.

Protect Electronic Devices from Electrostatic Discharge: ESD Compatible

The BX53M has an ESD dissipation capability that protects electronic devices from static electricity caused by human or environmental factors.

Image Quality

A History of Leading-Edge Optics

Combined high numerical aperture and long working distance

Objective lenses are crucial to a microscope’s performance.
The MXPLFLN objectives add depth to the MPLFLN series for epi-illumination imaging by maximizing numerical aperture and working distance at the same time. Higher resolutions at 20X and 50X magnifications typically mean shorter working distances, which forces the sample or objective to be retracted during objective exchange. In many cases, the MXPLFLN series’ 3 mm working distance eliminates this problem, enabling faster inspections with less chance of the objective hitting the sample.

Conventional 50X objective: NA 0.8, WD 1 mm / MXPLFLN50X: NA 0.8, WD 3mm

table

Learn More about MXPLFLN Objectives

Superior Optical Performance:
Wave Front Aberration Control

The optical performance of objective lenses directly impacts the quality of the observation images and analysis results. Olympus UIS2 high-magnification objectives are designed to minimize wavefront aberrations, delivering reliable optical performance.

Learn More about UIS2 Objective Lenses

_{Bad wavefront}

_{Good wavefront (UIS2 objective)}

Halogen: Color varies with light intensity.

_{Halogen lamp: Color varies with light intensity.}

_{LED: Color is consistent with light intensity and clearer than halogen lamp.}
^{* All images captured using auto exposure}

Consistent Color Temperature:
High-Intensity White LED Illumination

The BX53M utilizes a high-intensity white LED light sources for both reflected and transmitted light. The LED maintains a consistent color temperature regardless of intensity. LEDs provide efficient, long-life illumination that is ideal for inspecting materials science applications.

Superior Quality for Advanced Performance

Support Precise Measurement:
Auto Calibration

Similar to digital microscopes, automatic calibration is available when using PRECiV. Auto-calibration eliminates human variability in the calibration process leading to more reliable measurements. Auto calibration uses an algorithm that automatically calculates the correct calibration from an average of multiple measurement points. This minimizes variance introduced by different operators and maintains consistent accuracy, improving reliability for regular verification.

_{Semiconductor wafer (Binarized image):

Shading correction produces even illumination across the field of view.}

Seamless Stitching:
Image Shading Correction

PRECiV software features shading correction to accommodate for shading around the corners of an image. When used with intensity threshold settings, shading correction provides a more precise analysis.

Learn More about PRECiV

Applications

IC Pattern on a Semiconductor Wafer

Darkfield is used for detecting minute scratches or flaws on a sample or inspecting samples with mirrored surfaces, such as wafers.

MIX illumination enables users to view both patterns and colors.

MIX (Brightfield + Darkfield)

_{MIX (Brightfield + Darkfield)}

Darkfield

_Darkfield

Fluorescence

_Fluorescence

MIX (Fluorescence + Darkfield)

_{MIX (Fluorescence + Darkfield)}

Photoresist Residue on a Semiconductor Wafer

Fluorescence is used for samples that emit light when illuminated with a specially designed filter cube. This is used to detect contamination and photoresist residue.

MIX illumination enables the observation of both the photoresist residue and IC pattern.

LCD Color Filter

This observation technique is suitable for transparent samples such as LCDs, plastics, and glass materials.

MIX illumination enables the observation of both the filter color and circuit pattern.

Transmitted Light

_{Transmitted Light}

MIX (Transmitted Light + Brightfield)

_{MIX (Transmitted Light + Brightfield)}

Brightfield

_Brightfield

Differential Interference Contrast (DIC)

_{Differential Interference Contrast (DIC)}

Spheroidal Graphite Cast Iron

DIC is an observation technique where the height of a sample is visible as a relief, similar to a 3D image with improved contrast; it is ideal for inspections of samples that have very minute height differences, including metallurgical structures and minerals.

Sericite

Differential interference contrast (DIC) is an observation technique where the height of a sample, normally not detectable in brightfield, is visible as a relief, similar to a 3D image with improved contrast. It is ideal for inspections of samples that have very minute height differences, including metallurgical structures and minerals.

Brightfield

_Brightfield

Polarized Light

_{Polarized Light}

Infrared (IR)

_{Infrared (IR)}

Bonding Pads on a IC Pattern

IR is used to look for defects inside IC chips and other devices made with silicon on glass.

Specifications

SPECIFICATIONS OF BX53M SUGGESTED CONFIGURATION FOR GENERAL USE

			Entry		Standard		Advanced
Optical system			UIS2 optical system (infinity-corrected)
Main unit	Microscope frame		BX53MRF-S (Reflected)	BX53MTRF-S (Reflected/Transmitted)	BX53MRF-S (Reflected)	BX53MTRF-S (Reflected/Transmitted)	BX53MRF-S (Reflected)	BX53MTRF-S (Reflected/Transmitted)
	Focus		Stroke: 25 mm Fine stroke per rotation: 100 μm Minimum graduation: 1 μm With upper limit stopper, torque adjustment for coarse handle
	Max. specimen height		Reflected: 65 mm (w/o spacer), 105 mm (with BX3M-ARMAD) Reflected/Transmitted: 35 mm (w/o spacer), 75 mm (with BX3M-ARMAD)
	Observation tube	Wide field (F.N.22)	U-TR30-2-2 Inverted: trinocular
	Illumination	Reflected light Transmitted light	BX3M-KMA-S White LED, BF/DIC/POL/MIX FS, AS (with centering mechanism), BF/DF interlocking		BX3M-RLAS-S Coded, White LED, BF/DF/DIC/POL/MIX FS, AS (with centering mechanism), BF/DF interlocking
			－	BX3M-LEDT White LED Abbe/long working distance condensers	－	BX3M-LEDT White LED Abbe/long working distance condensers	－	BX3M-LEDT White LED Abbe/long working distance condensers
	Revolving nosepiece		U-5RE-2 For BF: Quintuple		U-D6BDRE For BF/DF: Sextuple			U-D6BDRES-S For BF/DF : Sextuple, Coded
	Eyepiece（F.N.22)		WHN10 WHN10X-H
	MIX observation		－					BX3M-CB Control box BX3M-HS Hand switch U-MIXR-2 MIX slider for reflected light observation U-MIXRCBL Cable for MIXR
	Condenser (Long working distance)		－	U-LWCD	－	U-LWCD	－	U-LWCD
	Power cable		UYCP (x1)					UYCP (x2)
	Weight		Reflected: approx.15.8 kg (microscope frame 7.4 kg) Reflected/transmitted: approx. 18.3 kg (microscope frame 7.6 kg)
Objectives	MPLFLN set		MPLFLN5X, 10X, 20X, 50X, 100X BF/POL/FL observation		－
	MPLFLN BD set		－		MPLFLN5XBD, 10XBD, BD, 50XBD, 100XBD BF/DF/DIC/POL/FL observation
	MPLFLN-BD, LMPLFLN-BD set		－		MPLFLN5XBD, 10XBD, LMPLFLN20XBD, 50XBD, 100XBD BF/DF/DIC/POL/FL observation
	MPLFLN-BD, MXPLFLN-BD, LMPLFLN-BD set		－		MPLFLN5XBD, 10XBD, MXPLFLN20XBD, 50XBD, LMPLFLN20XBD, 50XBD, 100XBD BF/DF/DIC/POL/FL observation
Stage (X x Y)	76 mm x 52 mm set		U-SVRM, U-MSSP Coaxial right handle stage / 76 (X) × 52 (Y) mm, with torque adjustment
	100 mm x 10 0mm set		U-SIC4R2, U-MSSP4 Large-size coaxial right handle stage / 100 (X) x 100 (Y) mm, with lock mechanism in Y axis
	100 mm x 100 (G) mm set		U-SIC4R2, U-MSSPG Large-size coaxial right handle stage / 100 (X) x 100 (Y) mm, with lock mechanism in Y axis (Glass plate)
	150 mm x 100 mm set		U-SIC64, U-SHG, U-SP64 Large-size coaxial right handle stage / 150 (X) x 100 (Y) mm, with torque adjustment, with lock mechanism in Y axis
	150 mm x 100 (G) mm set		U-SIC64, U-SHG, U-SPG64 Large-size coaxial right handle stage / 150 (X) x 100 (Y) mm, with torque adjustment, with lock mechanism in Y axis (Glass plate)
Option	MIX observation set*		BX3M-CB, BX3M-HS, U-MIXR-2, U-MIXRCBL				－
	DIC*		U-DICR
	Intermediate Tubes		U-CA, U-EPA2, U-TRU
	Filters		U-25ND6, U-25ND25, U-25LBD, U-25LBA, U-25Y48, U-AN360-3, U-AN360P, U-PO3, U-POTP3, U-25IF550, U-25L42, U-25, U-25FR
	Filter for condenser		43IF550-W45, U-POT
	Stage plate		U-WHP64, BH2-WHR43, BH2-WHR54, BH2-WHR65, U-WHP2
	Specimen holder		U-HRD-4, U-HLD-4, U-HRDT-4, U-HLDT-4
	Handle rubber		U-SHG, U-SHGT

_{*Cannot be used with U-5RE-2.}

BX53M / BXFM ESD UNITS

Items	Microscope frame	BX53MRF-S, BX53MTRF-S
	Illuminator	BX3M-KMA-S, BX3M-RLA-S, BX3M-URAS-S, BX3M-RLAS-S
	Nosepiece	U-D6BDREMC, U-D6BDRES-S, U-D6RE-ESD, U-D5BDREMC-ESD, U-5RES-ESD
	Stage	U-SIC4R2, U-MSSP4

SPECIFICATIONS OF BX53M SUGGESTED CONFIGURATION FOR DEDICATED USE

				Fluorescence		Infrared	Polarized
Optical system				UIS2 optical system (infinity-corrected)
Main unit	Microscope frame			BX53MRF-S (Reflected)	BX53MTRF-S (Reflected/ Transmitted)	BX53MRF-S (Reflected)	BX53MTRF-S (Reflected/Transmitted)
	Focus			Stroke: 25 mm Fine stroke per rotation: 100 μm Minimum graduation: 1 μm With upper limit stopper, torque adjustment for coarse handle
	Max. specimen height			Reflected: 65 mm (w/o spacer), 105 mm (with BX3M-ARMAD) Reflected/Transmitted: 35 mm (w/o spacer), 75 mm (with BX3M-ARMAD)
	Observation tube	Wide field (F.N.22)		U-TR30-2 Inverted: trinocular		U-TR30IR Inverted: trinocular for IR	U-TR30-2 Inverted: trinocular
		Polarized Light Intermediate Attachment (U-CPA)	Bertrand Lens	－		－	Focusable
			Bertrand Field Stop	－		－	ø3.4 mm diameter (fixed)
			Engage or disengage Bertrand lens changeover between orthoscopic and conoscopic observation	－		－	Position of slider ● in Position of slider ○ out
			Analyzer Slot	－		－	Rotatable Analyzer with Slot (U-AN360P-2)
	Illumination	Reflected light	FL observation	BX3M-URAS-S Coded universal reflected light, 4 position mirror unit turret, (standard: U-FWUS, U-FWBS, U-FWGS, U-FBF etc) With FS, AS (with centering mechanism), With shutter mechanism		－	－
			IR observation	－		BX3M-RLA-S 100W halogen lamp for IR, BF/IR, AS (with centering mechanism) U-LH100IR (Including 12V 10W HAL-L) 100W Halogen light source for IR TH4-100 100W power supply TH4-HS Hand switch U-RMT Extension cord	－
		Transmitted light	POL observation	－		－	BX3M-LEDT White LED Abbe/long working distance condensers
	Revolving nosepiece			U-D6BDRES-S For BF/DF : Sextuple, Coded		U-5RE-2 For BF : Quintuple	U-P4RE Quadruple, centerable attachable components 1/4 wavelength retardation plate (U-TAD), tint plate (U-TP530) and various compensators can be attached using plate adapter (U-TAD)
	Eyepiece（F.N.22)			WHN10X
				WHN10X-H			CROSS-WHN10X
	Mirror units			U-FDF For DF U-FBFL For BF, built-in ND filter U-FBF For BF, detactable ND filter U-FWUS For Ultra Violet-FL U-FWBS For Blue-FL U-FWGS For Green-FL		－
	Filter / Polarizer / Analyzer			U-25FR Frost filter		U-BP1100IR/U-BP1200IR Band path filters for IR	43IF550-W45 Green filter
				U-POIR Reflected polarizer slider for IR		U-AN360IR Rotatable analyzer slider for IR	U-AN360P-2 360° Dial-rotatable Rotatable minimum angle 0.1°
	Condenser			U-LWCD Long working distance		－	U-POC-2 Achromat strain-free condenser. 360°rotatable polarizer with swing-out achromatic top-lens. Click stop at position "0°" is adjustable. NA 0.9 (top-lens in) / NA 0.18 (top-lens out) Aperture iris diaphragm: adjustable from 2 mm to 21 mm diameters
	Slider / Compensators			－			U-TAD Slider (Plate adapter)
							U-TP530 Tint plate U-TP137 1/4 wavelength retardation plate
	Power cable			UYCP (x1)		UYCP (x2)	UYCP (x1)
	Weight			Reflected: approx.15.8 kg (microscope frame 7.4 kg)	Reflected/transmitted: approx. 18.3 kg (microscope frame 7.6 kg)	Approx.18.9 kg (microscope frame 7.4 kg)	Approx.16.2 kg (microscope frame 7.6 kg)
Reflected FL light source	Light guide			U-LGPS, U-LLGAD, U-LLG150, Light guide set		－	－
	Mercury lamp			U-LH100HGAPO1-7, USH-103OL (x2), U-RFL-T, U-RCV Mercury lamp set		－	－
Objectives	MPLFLN set			MPLFLN5X, 10X, 20X, 50X, 100X BF/DIC/POL/FL observation		－	－
	MPLFLN BD set			MPLFLN5XBD, 10XBD, BD, 50XBD, 100XBD BF/DF/DIC/POL/FL observation		－	－
	MPLFLN-BD, LMPLFLN-BD set			MPLFLN5XBD, 10XBD, LMPLFLN20XBD, 50XBD, 100XBD BF/DF/DIC/POL/FL observation		－	－
	MPLFLN-BD, MXPLFLN-BD, LMPLFLN-BD set			MPLFLN5XBD, 10XBD, MXPLFLN20XBD, 50XBD, LMPLFLN20XBD, 50XBD, 100XBD BF/DF/DIC/POL/FL observation		－	－
	IR set			－		LMPLN5XIR,10XIR,LCPLN20XIR,50XIR,100XIR IR observation	－
	POL set			－		－	UPLFLN4XP,10XP,20XP,40XP POL observation
Stage (X x Y)	76 mm x 52 mm set			U-SVRM, U-MSSP Coaxial right handle stage / 76 (X) × 52 (Y) mm, with torque adjustment
	100 mm x 10 0mm set			U-SIC4R2, U-MSSP4 Large-size coaxial right handle stage / 100 (X) x 100 (Y) mm, with lock mechanism in Y axis
	100 mm x 100 (G) mm set			U-SIC4R2, U-MSSPG Large-size coaxial right handle stage / 150 (X) x 100 (Y) mm, with lock mechanism in Y axis (Glass plate)
	150 mm x 100 mm set			U-SIC64, U-SHG, U-SP64 Large-size coaxial right handle stage / 150 (X) x 100 (Y) mm, with torque adjustment, with lock mechanism in Y axis
	150 mm x 100 (G) mm set			U-SIC64, U-SHG, U-SPG64 Large-size coaxial right handle stage / 150 (X) x 100 (Y) mm, with torque adjustment, with lock mechanism in Y axis (Glass plate)
	POL set			－			U-SRP+U-FMP Polarizing rotatable stage + Mechanical stage
Option	MIX observation set*			BX3M-CB, BX3M-HS, U-MIXR-2, U-MIXRCBL
	DIC*			U-DICR
	Intermediate Tubes			U-CA, U-EPA2, U-TRU
	Filters			U-25ND6, U-25ND25, U-25LBD, U-25LBA, U-25Y48, U-AN360-3, U-AN360P, U-PO3, U-POTP3, U-25IF550, U-25L42, U-25, U-25FR
	Filter for condenser			43IF550-W45, U-POT
	Stage plate			U-WHP64, BH2-WHR43, BH2-WHR54, BH2-WHR65, U-WHP2
	Specimen holder			U-HRD-4, U-HLD-4, U-HRDT-4, U-HLDT-4
	Handle rubber			U-SHG, U-SHGT