The KIF-PU is an interferometer system for analyzing the transmitted wavefront aberration of optical components. This system is optimal for evaluation of objective lenses or collimated lenses, particularly on the optical pickup production line.
Stable measurement maintained irrespective of difference in operators' skills
Standard equipment with the auto-alignment mechanism with a piezoelectric drive stage and dedicated software reduces measurement variations due to alignment errors. This function demonstrates its performance in transmitted wavefront measurement of optical pickup lenses.
Available for measurement of 405nm-band and 650nm-band lenses
This system is standard-equipped with two-wavelength light sources of 405nm and 658nm which can be switched in a simple operation, thereby allowing evaluation of optical components with either wavelength.
Capable of switching between linear and circular polarized light
To measure a polarization-dependent test substance to be used for an optical pickup component, switching between linear and circular polarized light is needed. This system is optimal for transmitted wavefront measurement of birefringent components such as a plastic and crystal.
Compact and high-rigidity
The compact and high-rigidity main unit takes up less space in view of the operating environments on the shop floor, thus supporting quick quality inspections.
Capable of OK/NG judgment
The dedicated software allows easy OK/NG judgment on a production line with the OK/NG judgment setup function according to arbitrarily settable tolerances.
1.Analysis result display functions
・P-V, RMS, Pwr
・Seidel aberrations (tilt, focus, astigmatism, coma, spherical aberration)
・Zernike coefficients (3, 4, 9, 16, 25, 36 terms)
・3D bird's-eye view, 2D color map
・Cross-section profile (X-direction, Y-direction, PV, RMS)
・OK/NG judgment result
2.File input/output functions
・Save/read of work parameters
・Save/read of fringe data
・Save/read of mask data
・Save/read of screen layouts
・Main window printing
・Mask setting (square, circular, polygonal, auto-masking)
・Auto mask setting
4.Work parameters setup functions
・Product name, unit name, comment
・Wavelength (405/658 nm)
・Fitting order (3/4/9/16/25/36)
・Aberration elimination (aberration specification/Zernike coefficient specification)
・Display units (λ, μm, nm, fringe)
・Offset setting for Zernike coefficients
・Rated values (each aberration specification and user-defined expression)