MXPLFLN-BD
Overview
We used novel manufacturing technology to create objective lenses with simultaneously improved numerical aperture, working distance, and aberration correction. Their high numerical aperture (NA) and 3 mm working distance improves sample transport, enabling greater throughput in automated semiconductor inspection. 20X and 50X lenses are available.
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High Numerical Aperture and Long Working Distance MX Plan Semi-Apochromat Objectives – MXPLFLN-BD
- Designed for brightfield, darkfield, differential interference contrast (DIC), fluorescence, and simple polarized light observation methods
- Combines a high NA, long working distance, and image flatness
- Available in 20X and 50X magnifications with a 3 mm working distance
MXPLFLN50XBD
The MXPLFLN50XBD is our first 50X objective with a 0.8 numerical aperture and 3 mm working distance. Compared to a LMPLFLN100X objective, the observation range is four times greater thanks to the 0.8 NA at 50X magnification.
MXPLFLN20XBD
The MXPLFLN20XBD is our first 20X objective with a 0.55 numerical aperture and 3 mm working distance. Its high NA and high image flatness produces homogenous images that are ideal for stitching.
MXPLFLN20XBD
Specifications
| Magnification [X] | 20 |
|---|---|
| Numerical aperture (NA) | 0.55 |
| Working distance (WD) [mm] | 3 |
| Objective field number | 26.5 |
| Immersion medium | Air/dry |
| Spring loaded | N/A |
| Correction collar | N/A |
| Correction range of correction collar | N/A |
| Iris | N/A |
| Correction level of chromatic aberration | Semi-apochromat (FL) |
| Parfocalizing distance [mm] | 45 |
| Back focal plane (BFP) position | -8.0 |
| Type of screw thread | W26 × 0.706 |
| Brightfield (Reflected) | Good |
| Brightfield (Transmitted) | Good |
| Darkfield (Reflected) | Good |
| Darkfield (Transmitted) | N/A |
| DIC (Reflected) | Good |
| DIC (Transmitted) | N/A |
| Phase contrast | N/A |
| Relief contrast | N/A |
| Polarized light | Limitation |
| Fluorescence (B, G excitation) | Good |
| UV fluorescence (at 365 nm) | N/A |
| Multiphoton | N/A |
| TIRF | N/A |
| IR | N/A |
| WLI | N/A |
| Auto focus | Good |
Transmittance/Wavelength
Dimensions
MXPLFLN50XBD
Specifications
| Magnification [X] | 50 |
|---|---|
| Numerical aperture (NA) | 0.8 |
| Working distance (WD) [mm] | 3 |
| Objective field number | 26.5 |
| Immersion medium | Air/dry |
| Spring loaded | N/A |
| Correction collar | N/A |
| Correction range of correction collar | N/A |
| Iris | N/A |
| Correction level of chromatic aberration | Semi-apochromat (FL) |
| Parfocalizing distance [mm] | 45 |
| Back focal plane (BFP) position | -8.0 |
| Type of screw thread | W26 × 0.706 |
| Brightfield (Reflected) | Good |
| Brightfield (Transmitted) | Good |
| Darkfield (Reflected) | Good |
| Darkfield (Transmitted) | N/A |
| DIC (Reflected) | Good |
| DIC (Transmitted) | N/A |
| Phase contrast | N/A |
| Relief contrast | N/A |
| Polarized light | Limitation |
| Fluorescence (B, G excitation) | Good |
| UV fluorescence (at 365 nm) | Good |
| Multiphoton | N/A |
| TIRF | N/A |
| IR | N/A |
| WLI | N/A |
| Auto focus | Good |
Transmittance/Wavelength
Dimensions
