The MX61L/ MX61, 300 mm/ 200 mm semiconductor inspection microscope provides exceptional image resolution and clarity through observation methods such as brightfield, darkfield, differential interference contrast (DIC), fluorescence and infrared.
 Illumination Intensity Knob
 Rotation for the Objective Lens Turret
 Aperture Stop Adjustment
|The key controls of the MX61L/ MX61 are positioned at the operator's fingertips at the front of the microscope, near the focusing knobs. The objectives, illumination intensity and aperture can all be adjusted without the operator taking their eyes away from the eyepieces or removing their hands from the focusing knobs.|
Tilting Observation Tube
|The extensive range of the tilting observation tube allows the operator to sit at the microscope using the proper posture ensuring reliable and comfortable operation.|
Stage handle with built-in clutch
|The 300mm manual XY stage is capable of both coarse and fine stage movements by using the built-in clutch mechanism and XY knobs. Using the clutch, the operator can freely move the stage while performing inspections.|
The objective is the core part of the optical microscope, used for the illumination and observation of material science samples. Olympus has the widest choice of objectives, universal objectives suitable for all contrast methods, long and ultra long working distance objectives, near-infrared objectives, LCD inspection objectives and many more.
|Example Observation Images|
|Diverse Lineup Allows Selections According to the Purpose|
|MPLAPON||Plan Apochromat Objective Lens Series|
|MPLFLN||Semi Apochromat Objective Lens Series for Brightfield|
|MPLFLN-BD||Semi Apochromat Objective Lens Series for Brightfield and Darkfield|
|MPLFLN-BDP||Semi Apochromat Objective Lens Series for Brightfield and Darkfield|
|LMPLFLN||Long WD Semi Apochromat Objective Lens Series for Brightfield|
|LMPLFLN-BD||Long WD Semi Apochromat Objective Lens Series for Brightfield and Darkfield|
|MPLN||Plan Achromat Objective Lens Series for Brightfield|
|MPLN-BD||Plan Achromat Objective Lens Series for both Brightfield and Darkfield|
|SLMPLN||Super Long WD Plan Achromat Objective Lens Series|
|LCPLFLN-LCD||Long WD Semi Apocromatic Objective Lens Series for LCD|
The MX61L/ MX61 is equipped with a PC interface for control of the microscope. Objective magnifications can be automatically stored while capturing images. This guarantees reliable image information for further processing and analysis.
Olympus offers a wide range of imaging and analysis solutions including a variety of digital cameras as well as software. Our most advanced software, integrates with the Olympus MX61L/ MX61 and performs mission-critical tasks such as image acquisition, specialized image processing, measurement functions, statistical outputs, annotation, archiving, report generation and database management including an optional Secure File Repository for added security.
Motorized Revolving Nosepiece
|The rotational speed of the motorized nosepieces are ultra-fast, decreasing time between inspections while maintaining clean room compatibility. Olympus offers three variations for desired inspection methods controlled via software, frame button or independent handset.|
Automatic Aperture Stop Control
|The integrated motorized aperture stop automatically adjusts for the objective lens in use. Thus the best image quality for every magnification is achieved, making routine inspections more comfortable for the eyes and more efficient for the operator.|
AL120 Wafer Handler and MX61L Semiconductor Inspection Microscope
The MX61L/ MX61 is perfectly suited to interface with the Olympus AL series of wafer handlers for fast and efficient wafer transfer for 100-200mm wafers. Compatible with most substrates, the AL120 wafer handlers now transfer wafers as small as 90um in thickness. Macro wafer inspection is available on board with the ability to view the entire rear surface of the wafer without manual intervention. Coupling the AL series to the MX61L/ MX61 provides fast cassette-to-cassette operation,
minimizing the chance of accidental damage to the wafer.
*AL120 may not be available in some area.
The specially designed IR objective lenses and components are ideal for imaging features and defects beneath the surface of silicon and glass. The Semiconductor and Photovoltaic industries use IR imaging for alignment, identification of sub-surface contamination and critical dimension inspections. The 20x, 50x and 100x objectives are designed with a correction collar that corrects for the aberrations caused by the thickness of silicon and glass, improving overall contrast. Olympus supports several IR digital cameras for near infrared imaging and analysis.
The MX61L/ MX61 can be equipped with fluorescence observation by adding a mirror cube and high intensity light source. Fluorescence observation is ideal for easy detection of resist residuals and organic particles.
Fluorescence Mirror Cubes
Transmitted Light Module
|Transmitted light can be added to the MX61L/ MX61 for photo-mask or flat panel display inspections. Two types are available, one with a universal condenser and a second type with a high numerical aperture. Both support simple polarized light. Transmitted light can be added to the MX61 for photo-mask or flat panel display inspections. Two types are available, one with a universal condenser, MX-TILLA, and a second type with a high numerical aperture, MX-TILLB. Both support simple polarized light.|
|Semiconductor/FPD Inspection Microscope Specifications||MX61L||MX61|
|Optical System||UIS2 Optical System (Infinity-corrected)|
|Microscope Frame||Observation Method||BF/DF/DIC/KPO*/FL|
|Illuminator||Microscope Frame All-in-one (BF, DF + 1 Option)|
|Illumination System||Reflected Light||100 W Halogen/100 W Mercury/75 W Xenon|
|Transmitted Light||Fiber Light Guide|
|Resolution/Fine Adjustment Sensitivity||Fine Stroke per Rotation 0.1 mm|
|Maximum Specimen Height||30 mm|
|Revolving Nosepiece||Motorized Type||Sextuple for BF/DIC Quintuple for BF/DF/DIC Centerable Quintuple for BF/DF/DIC Sextuple for BF/DF/DIC|
|Stage||Stroke||14x12 inch Right Handle Stage: 356(X)x305(Y)mm (Transmitted Light Range 356x284 mm)||
8x8 inch Right Handle Stage: 210(X)x210(Y)mm (Transmitted Light Range 189x189 mm)
6x6 inch Right Handle Stage: 158(X)x158(Y)mm
|Observation Tube||Widefield (Field Number 22)||Inverted Image||Binocular/Trinocular Observation Tube|
|Erect Image||Trinocular Observation Tube|
|Super Wide Field (Field Number 26.5)||Inverted Image||Trinocular Observation Tube|
|Erect Image||Tilting Trinocular Observation Tube|
|Option Unit||IR Unit/Motorized Stage/Wafer Loader|
|Dimensions||710(W)x843(D)x507(H)mm (in Standard Combination)||509(W)x843(D)x507(H)mm (in Standard Combination)|
|Weight||51 kg (in Standard Combination)||40 kg (in Standard Combination)|
|Remark||*Simple Polarized Light Observation|