1.Analysis result display functions
・P-V, RMS, Pwr
・Seidel aberrations (tilt, focus, astigmatism, coma, spherical aberration)
・Zernike coefficients (3, 4, 9, 16, 25, 36 terms)
・3D bird's-eye view, 2D color map
・Cross-section profile (X-direction, Y-direction, PV, RMS)
・OK/NG judgment result
2.File input/output functions
・Save/read of work parameters
・Save/read of fringe data
・Save/read of mask data
・Save/read of screen layouts
・Main window printing
・Mask setting (square, circular, polygonal, auto-masking)
・Auto mask setting
4.Work parameters setup functions
・Product name, unit name, comment
・Wavelength (405/658 nm)
・Fitting order (3/4/9/16/25/36)
・Aberration elimination (aberration specification/Zernike coefficient specification)
・Display units (λ, μm, nm, fringe)
・Offset setting for Zernike coefficients
・Rated values (each aberration specification and user-defined expression)
|Transmitted Wavefront Measuring Interferometer for Flat Surfaces KIF-PU-F: Specifications|
|Measured wavelength||405 nm, 658 nm (laser class 2 product)|
|Interference method||Twyman-Green interferometer|
|Measured optical beam diameter||
Measurable diameter: ø2 to ø6 mm
Approximately 2 to10 mm square (prism, mirror, etc.)
|Reflecting flat mirror accuracy||λ/30 (effective diameter: ø6 mm or less)|
|Reflecting plane rotatable range||50° to 180° (measurable reflection angle: 0° and 25° more)|
|Reflecting mirror operating range||±2°|
|Polarization specification||Switching between circular and linear polarized light|
|Magnification||1X, 3X (digital magnification switching)|
|Analysis method||Fringe scanning method|
|System mass||Main unit: Approx. 26 kg (excluding the PC)|
|System dimensions||Main unit: 330 (W) x 465 (D) x 370 (H) mm|
|Power source specification||
100 to 240 VAC
50/60 Hz, 100 VA
Level place with minimum vibration (floor vibration: ±0.8 m/s2 or less)
Temperature: 23±3 °C
Humidity: 60% or less, with no condensation
* This system shall not guarantee absolute accuracy in conformity with the traceability system.
This is an interferometer for analyzing a transmitted wavefront and a reflected wavefront on flat-surface optical components such as prisms or mirrors, particularly on the optical pickup production line.
Measurement possible according to the angle of reflection of an object to be measured
The folded reflection plane with a variable angle allows measurement according to the reflection angle specification of an object to be measured. The transmitted and reflected wavefronts of a beam splitter, etc. can also be measured on the same reflection plane.
Available for measurement of 405 nm-band and 650 nm-band lenses
This system is standard-equipped with two-wavelength light sources of 405nm and 658nm which can be switched in a simple operation, thereby allowing evaluation of optical components with either wavelength.
Capable of switching between liner and circular polarized light
To measure a polarization-dependent test substance to be used for an optical pickup component, switching between liner and circular polarized light is needed. This system is optimal for transmitted wavefront measurement of birefringent components such as a plastic and crystal.
Compact and high-rigidity
The compact and high-rigidity main unit takes up less space in view of the operating environments on the shop floor, thus supporting quick quality inspections.
Available for OK/NG judgment
The dedicated software allows easy OK/NG judgment on a production line with the OK/NG judgment setup function in accordance with arbitrarily settable tolerances.