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USPM-RU-W

近赤外顕微分光測定機 USPM-RU-W

Olympus' USPM-RU-W Enables Accurate and Fast Measurements of Curves Surfaces and Minute Areas

Olympus' USPM-RU-W NIR Micro-Spectrophotometer performs fast, accurate spectrometry across a wide range of wavelengths of visible light to near-infrared.The ability to easily measure reflectivity of extremely small areas or curved surfaces that cannot be measured using ordinary spectrophotometers, makes the USPM-RU-W optimally suited for analyzing optical elements or minute electronics parts.

Near-Infrared Micro-Spectrophotometer

■ Reflectivity, Film thickness, Object color, and transmittance measured in seconds
■ Wide range of wavelength from 380 to 1050 nm
■ Measures reflectivity on curved surface without contact

Measure Reflectivity

Measure the reflectivity of a minute area with a diameter ranging from 17 to 70 um

Optical Path of Reflectivity Measurement
Optical Path of Reflectivity Measurement
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Example of reflectivity measurement : lens
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Example of reflectivity measurement : lens curvature

Measure Film Thickness

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Film Thickness Measurement Screen-shot
Use reflectivity data to measure the thickness of single-layer or multi-layer films of approximately 50 nm to 10 μm.

Measure Object Color

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Object Color Measurement Screen-shot
Display an XY chromaticity diagram, an L*a*b* chromaticity diagram, and their related numeric values based on reflectivity data.

Measure Transmission Levels (Available as an option)

Measure the transmittance of a plane sample by transmitting 2 mm parallel beams of lights through the sample to the spectrophotometry acceptance elements.

Optical Path of Transmittance Measurement
Optical Path of Transmittance Measurement

Measure Reflectivity at an Incidence Angle of 45 Degrees(Available as an option)

Measure the reflectivity at an incidence angle of 45 degrees by reflecting 2 mm parallel beams of lights to the spectrophotometry acceptance elements.

Optical Path of 45-degree Reflectivity Measurement
Optical Path of 45-degree Reflectivity Measurement

Fast Measurements of Curves Surfaces and Minute Areas

Provides High-speed Measurement

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Optical system image
Quick, high repeatability measurements can be achieved in seconds using a flat field grating, line sensor and high-speed spectrophotometry.

Optimally Suited for Reflectivity Measurement of Extremely Small Parts and Lenses

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Image of reflectivity measurment
Olympus has designed a new dedicated objective lens that provides non-contact measurements across an area of 17 to 70 μm diameters. The new lens provides high repeatability on even curved surfaces or minute electronic parts.

Anti-reflection Processing is Not Required on the Back of the Sample

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Principle of backside reflection elimination
Accurate measurement of surface reflectivity can be performed without the costly steps needed to prevent rear surface reflection. Rear surface-reflected light is reduced by means of special optics that block all out-of-focus light reflection similar to a confocal system. Whether your optical component is spherical,aspherical or flat, the USPM-RU-W does not require sample preparation through anti-reflection treatments.

Available Film Thickness Measurement Methods

The single-layer or multi-layer film thickness can be analyzed according to the measured spectral reflectivity data. You can select the optimum measurement method for the application.

Peak-valley Method

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Peak valley film thickness analysis result
This method is used to calculate film thickness based on the periods between the peaks and valleys of the measured spectral reflectivity value, and is effective for measuring single-layer film. No complicated settings are required, so measuring film thickness is easy.

Fourier Transform Method

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Fourier transform film thickness analysis result
This method is used to calculate film thickness based on the periods between measured spectral reflectivity values, and is effective for measuring single-layer and multilayer films. The Fourier transform method eliminates noise, thus making analysis possible when it is difficult to detect peak and valley values.

Curve Fit Method

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Curve fitting film thickness analysis result

This method is used to calculate film thickness by estimating which structure has the smallest difference between the measured spectral reflectivity and the calculated reflectivity for that structure, and is effective for measuring single-layer and multilayer films. The curve fit method also makes it possible to analyze thin film in which peak and valley values are not apparent.

Diverse application

Satisfies Diverse Measurement Needs at High Speed and With High Precision

Evaluation of Lens Coating for reflectivity,color and film thickness.

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Mobile Phone Camera Lenses
Projector Lenses
Digital Camera Lenses
Spectacle Lenses

Examining the Reflectivity and Film Thickness of Minute Electronic Parts.

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LED Packages
Printed Circuit Boards

Reflectivity, Film Thickness and Transmittance measurment of Planar Optical Elements.

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LCD color filters
Optical films

Optical Elements Reflectivity at an Incident Angle of 45 Degrees.

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Prisms
Mirrors

USPM-RU-W NIR Micro-Spectrophotometer:Specifications
Reflectivity measurementTransmittance Measurement*1Reflectivity Measurement for 45-Degrees*1
Name NIR Micro-Spectrophotometer Transmittance measurement set for
NIR Micro-Spectrophotometer
45-degree reflectance measurement set for
NIR Micro-Spectrophotometer
Model USPM-RU-W
Measured wavelength 380 to 1050 nm
Measurement method Compared with a reference sample for measurement Transmissivity is measured with 100% as standard Compared with a reference sample for measurement
Measurement range See the specifications of the objective lens below Approx. 2.0 mm in diameter
Measurement repeatability(3σ) *2 Reflectivity measurement During use of 10x and 20x objective lenses ±0.02% or less (430 to 1010 nm)
±0.2% or less (Except as described above)
±0.3% or less (430 to 1010 nm)
±1.0% or less (Except as described above)
During use of a 40x objective lens ±0.05% or less (430 to 950 nm)
±0.5% or less (Except as described above)
Film thickness measurement ±1%  -
Wavelength display resolution 1nm
Lighting accessory Dedicated halogen light source, JC12V 55W (Average life: 700 hours)
Shift stage Loading surface size: 200 (W) x 200 (D) mm
With stand load: 3 kg
Operating range: (XY) ±40 mm, (Z) 125 mm
Tilt stage Loading surface size: 140 (W) x 140 (D) mm
Withstand load: 1 kg
Operating range: (XT) ±1*, (YT) ±1*
Weight Main body: Approx. 26 kg (not including PC) Main body: Approx. 31 kg (not including PC)*3
Control power box: Approx. 6.7 kg
Dimensions Main body: Approx. 26 kg (not including PC) Main body: Approx. 31 kg (not including PC)*3
Control power box: 250 (W) x 270 (D) x 125 (H) mm
Power specifications Input specifications: 100 to 240 VAC, 110 VA 50/60 Hz
Operating environment Horizontal place not subject to vibration
Temperature: 15 ºC to 30 ºC
Humidity: 15% to 60% RH (Free from dew condensation)

*1 Optional unit *2 Measured under the measurement conditions of our company. *3 The total combined weight of both the installed transmissivity measurement

Objective lens
ModelUSPM-OBL10USPM-OBL20USPM-OBL40
Magnification 10x 20x 40x
NA 0.12 0.24 0.24
Measurement range*4 70μm 35μm 17.5μm
Operating distance 14.3mm 4.2mm 2.2mm
Operating distance ±5 mm or more ±1 mm or more ±1 mm or more

*4 Spot diameter

Spectral Analysis Software with an Easy-to-use User Interface

Easy-to-understand Display

GUIレイアウト例
Eample of GUI layout
Change the layout and position, size, and visibility of each window according to the measurement purpose and user needs.

Diverse Measurement Results

反射率/透過率グラフ、反射率/透過率テキスト、XY/L*a*b*色度図、膜厚。
Reflectivity/transmittance graph, reflectivity/transmittance text, XY/L*a*b* chromaticity diagram
Spectral reflectivity/transmissivity graphs and text, color measurement (XY and L*a*b* chromaticity diagrams), and film thickness measurement values can be displayed on one screen for easy understanding.

Easy Position Adjustment and Focus Adjustment

Positioning the measuring point is easy by using a focusing window for Z axis alignment and centering (CT) window for X and Y axis alignment.

フォーカス(Z軸)調整画面
Focus
センタリング(X軸・Y軸)調整画面
Position Adjustment

Flexibility for Any Application

ワーク設定、レイヤ(膜厚)設定、グラフ設定、パラメータ設定。
Work setting, layer setting, graph setting, parameter setting
The USPM-RU-W software can be configured to achieve optimum performance for your specific sample.

Tolerance setting function of automatic pass / fail determination.

規格設定をした反射率測定例
Example of reflectivity measurement with Tolerance setting function
System can be configured to provide good / no good designations automatically.

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